Roughness and correlations in the transition from island to film growth: Simulations and application to CdTe deposition

Using kinetic Monte Carlo simulations, we develop a framework to relate morphological properties and microscopic dynamics during island growth, coalescence, initial formation of continuous heteroepitaxial films. The average width is controlled by adatom mobility on the substrate. Subsequent evolution strongly depends Ehrlich-Schw\"{o}ebel energy barrier $E_{ES}$ deposited material. As decreases, islands becomes taller their coalescence delayed. For small large $E_{ES}$, global roughness increases as $W\sim{\text{thickness}}^{1/2}$ local at short scales (apparent anomalous scaling) before after coalescence. If are wide, $W$ may have plateau for has maximum when coalesce. This applied atomic-force microscopy data stages CdTe deposition Kapton: indicates negligible ES barrier, consistently with scaling much thicker films, diffusion coefficient ${10}^{-7}{\text{--}}{10}^{-5}{\text{cm}}^2/{\text s}$ Kapton surface $150\,^{\circ}\mathrm{C}$ estimated. Applications other materials suggested, in which expected roles barriers highlighted.